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Molecular pump manufacturers Molecular pumps in semiconductor equipment
- Categories:Molecular Pump factory
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- Time of issue:2023-05-03
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(Summary description)In the production process of molecular pump factory, molecular pump is widely used in key equipment such as lithography machine, thin film deposition equipment, etching equipment, ion implanter and so on.
Molecular pump manufacturers Molecular pumps in semiconductor equipment
(Summary description)In the production process of molecular pump factory, molecular pump is widely used in key equipment such as lithography machine, thin film deposition equipment, etching equipment, ion implanter and so on.
- Categories:Molecular Pump factory
- Author:
- Origin:
- Time of issue:2023-05-03
- Views:0
In the production process of molecular pump factory, molecular pump is widely used in key equipment such as lithography machine, thin film deposition equipment, etching equipment, ion implanter and so on.
Molecular pump factory etching equipment
Molecular Pump Factory believes that etching is the process of selectively removing unwanted materials from the surface of silicon wafers by chemical or physical methods. The basic goal of etching is to correctly replicate the mask pattern on the glue-coated silicon wafer. Modern dry etching equipment includes complex mechanical, electrical and vacuum systems, as well as automated etching endpoint detection and control devices. The etching application conditions are complex, the cleanliness is poor, and there are many kinds of special gases filled. Therefore, the molecular pump factory believes that dry pumps and magnetic levitation molecular pumps need special treatment.
Molecular Pump Factory Ion Implantation Equipment
Molecular pump factory ion implantation equipment: Ion implantation refers to the phenomenon that in a vacuum environment, when an ion beam is directed to a solid material, the speed is slowly reduced by the resistance of the solid material, and finally stays in the solid material. Ion implantation is the main technique for doping the area near the semiconductor surface, and its purpose is to change the carrier concentration and conductivity type of the semiconductor. The ion implanter is a key device in the manufacturing process of integrated circuits, and requires a high-clean vacuum environment to ensure the accuracy of ion doping concentration and dose.
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